PR:IME™
An Industry-First Pre-Engineered Platform. Designed to Integrate Your Semiconductor Inspection & Metrology Technology
Accelerating Lab-to-Fab Transition for Semiconductor Inspection & Metrology
PR:IME™ by Owens Design is a modular system architecture designed to accelerate the commercialization of Inspection & Metrology (I&M) technologies. Featuring standardized mechanical, electrical, and software interfaces, it reduces development overhead and streamlines integration, delivering your technology to fab customers with unmatched speed and efficiency.
Overview
A Fast, Low-Risk Path to Market
Innovations in Inspection and Metrology are being developed around the world at universities, labs, startups, and established equipment companies. But often times resources are focused on developing the technology itself and not the path to delivering a production-worthy system to the market. This path can be difficult for companies to overcome. It can be held back by lack of industry expertise, manufacturing infrastructure, or even customer concerns with scaling risk.
PR:IME™ bridges these gaps with a pre-engineered, fab-ready platform that streamlines the transition from R&D to high-volume manufacturing (HVM). Designed for both flexibility and scalability, it supports manual loading and fully automated wafer handling for 300mm and 200mm wafers. By leveraging PR:IME™, technology innovators can stay focused on their core expertise while Owens Design manages seamless system integration, accelerating time-to-market and minimizing development costs.
Why PR:IME™?
Automation Levels
PR:IME™ R&D
Low Risk Path From R&D to HVM
- Semi-automated system
- Manually loaded wafer (EFEM-ready)
- Optional S2/S8, CE Mark compliance
- No fab-level communication
PR:IME™ HVM
Production-Ready, Fully Automated
- 2 port EFEM
- Recipe Editor
- S2/S8, CE Mark Evaluation
- SECS/GEM fab communication
Key Modules
- Equipment Front End Module (EFEM):
PR:IME™ partners with world-class EFEM brands, ensuring global support and seamless adoption in top-tier semiconductor fabs. Available in 2-4 port configurations, EFEM options are tailored to meet specific product requirements. - Stage:
Most I&M applications require precise wafer positioning for accurate inspection. PR:IME™’s stage provides accurate and repeatable wafer placement with micron-level precision. Customization is available for specializations beyond the baseline configuration, including higher speed/acceleration, lower velocity ripple, nanometer precision, or magnetic shielding. - Equipment Control Software Platform:
PR:IME™ offers two industry-leading automation software options for system control and wafer handling. PR:IME™ simplifies integration and customization, providing a user interface that represent your company’s identity and hardware configuration. - System Enclosure:
PR:IME™’s enclosure includes provisions for ULPA FFU, ionizers, observation cameras, and easy access for maintenance. Facilities connections are conveniently positioned for easy fab integration, with optional consumption monitoring features to support compliance with green initiatives. - Vibration Isolation:
Uncompensated transient vibration can reduce I&M data resolution, leading to measurement inaccuracies. PR:IME™ offers multiple levels of vibration isolation tailored to your technology requirements. From basic elastomer mounts to advanced active vibration isolation and acoustic enclosures, PR:IME™ ensures the precise level of damping needed for optimal performance.